PLD Production platform

SolMates PLD production Platform (SIP-800 & -1200)

The SIP-800 (manual) and SIP-1200 (EFEM) accelerate the entry of new materials into commercial products. New materials are required in order to meet upcoming technology nodes or to progress ‘beyond Moore’. Pulsed laser deposition (PLD) allows easy screening and optimization of innovative thin film materials or stacks. The SIP-800 & -1200 platform is the ultimate proof that PLD has now reached the maturity level of High Volume Manufacturing (HVM). This next generation deposition system is suitable for development and (pilot-) production purposes, and is designed for stability, reliability and low maintenance. Equipped with automated wafer handling (SIP 1200) it offers high run-to-run consistency at commercial throughput and yield.

SIP-800 & -1200 Basic features:

Substrate size:

100/ 150 / 200 mm


Substrate type:

Round, squares

Target capacity:

Up to 4 targets in situ changeable

Beam delivery:

Complete integrated beam delivery optics



Process temp.:

RT -  800 ºC




WiW:                < 2 % 1s
WtW / RtR:      < 1.5 % 1s

For more information please contact us.



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