The reactor of the PiezoFlare 1200 is similar to its development version, the PiezoFlare 800.
The main differences are the automated wafer handling, the software and GUI.
For throughput optimization an additional option is to select a higher power excimer laser.
|03-04-2014||Analysis of thin-film PZT/LNO stacks on an encapsulated TiN electrode|
|04-11-2013||SolMateS PZT to be used in new band-pass concept|
|04-11-2013||Arjen Janssens gives an interview in the October issue of MEMS Trends|
|24-10-2013||Arjen Janssens, CEO at SolMateS, gives presentation at BIT's 1st Frontier Industrial Forum...|
|05-09-2013||Looming IC Industry Changes Mean Proliferation of New Materials Needs|
|07-05-2014||High-Tech Systems 2014|