Pulsed laser deposition
SolMateS thin film process equipment is based on pulsed laser ablation. A high power laser is used to evaporate material from a target. Subsequently the vaporized material condenses on a wafer or substrate. The current PiezoFlare platform allows deposition on wafers or substrates up to Ø200mm.
The pulsed laser deposition method offers many advantages above other conventional techniques. In particular the one-to-one transfer of elements from target to substrate is highly beneficial for the deposition of multiple element material systems.
Piezoelectric thin films
SolMateS has extended knowledge on the deposition and characterization of piezoelectric thin films such as Pb(Zr,Ti)O3 (PZT). On the PiezoFlare a PZT process recipe is available. For specific information on PZT thin films you can contact Solmates.
Transparent conducting oxides
The PiezoFlare is capable of coating transparent electrical conducting layers on sensitive substrates at high speed. This enables the scaling to volume production of many applications in transparent electronics such as flexible displays and OLEDs. For information you can contact Solmates.
The flexibility of the PiezoFlare equipment allows deposition of many novel material systems. This facilitates the development of high potential applications; i.e. multiferroics for data storage, electro-optics for high speed telecommunication and mixed ionic-electronic conductors for solid oxide fuel cells. For information contact you can contact Solmates.
|02-06-2014||Prototype of new transistor for lower power consumption|
|03-04-2014||Analysis of thin-film PZT/LNO stacks on an encapsulated TiN electrode|
|04-11-2013||SolMateS PZT to be used in new band-pass concept|
|04-11-2013||Arjen Janssens gives an interview in the October issue of MEMS Trends|
|24-10-2013||Arjen Janssens, CEO at SolMateS, gives presentation at BIT's 1st Frontier Industrial Forum...|