PiezoFlare 800

The PiezoFlare 800 is a manually operated PLD system.

This equipment can hold up to 4 different targets and can process any wafer or substrate size below a diameter of 200 mm (or 150 mm square).
The source of the Pulsed Laser process is an 80 Watt Excimer laser with a fully automated beam delivery system. The tool has been designed for ease of maintenance with a high standard of reproducibility and stability.

The reactor can process in a vacuum environment with a temperature ranging from 25 up to 800 °C with background gasses as N2, O2, or Ar and on request additional gasses are possible.

News

02-06-2014 Prototype of new transistor for lower power consumption
03-04-2014 Analysis of thin-film PZT/LNO stacks on an encapsulated TiN electrode
04-11-2013 SolMateS PZT to be used in new band-pass concept
04-11-2013 Arjen Janssens gives an interview in the October issue of MEMS Trends
24-10-2013 Arjen Janssens, CEO at SolMateS, gives presentation at BIT's 1st Frontier Industrial Forum...

Events

28-10-2014 Piezo Mems 2014, Japan