PiezoFlare 800

The PiezoFlare 800 is a manually operated PLD system.

This equipment can hold up to 4 different targets and can process any wafer or substrate size below a diameter of 200 mm (or 150 mm square).
The source of the Pulsed Laser process is an 80 Watt Excimer laser with a fully automated beam delivery system. The tool has been designed for ease of maintenance with a high standard of reproducibility and stability.

The reactor can process in a vacuum environment with a temperature ranging from 25 up to 800 °C with background gasses as N2, O2, or Ar and on request additional gasses are possible.

 

 

 

 

 

 

 

 

 

 

 

 

News

10-11-2014 SolMateS enables full transparent OLEDs with its patented ITO on OLED deposition process
16-10-2014 Professors Dave Blank and Guus Rijnders, co-founders of SolMateS, win prestigious FOM Valo...
01-06-2014 Prototype of new transistor for lower power consumption
02-04-2014 Analysis of thin-film PZT/LNO stacks on an encapsulated TiN electrode
03-11-2013 SolMateS PZT to be used in new band-pass concept

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